全部 98.0%GC 98.0%GC&T 98.0%LC&T 98.0%T 97.0%GC 99.0%GC 98% 98.0%LC 97% 95.0%GC 95% 99% 97.0%GC&T 99.99% metals basis 98.0%LC&N 96.0%GC ≥98% 99.9% metals basis 99.95% metals basis 97.0%T 供含量测定用 >98.0%(GC) 99.0%T 97.0%LC 95.0%T 97.0%LC&T 99.0%GC&T 98.0%N 95.0%GC&T 99.5%GC 95.0%LC 99.999% metals basis ≥97% >98.0%(HPLC) 98%,99% ee AR 含量/限量测定用 ≥95% AR,99% >98.0%(T) 99.0%LC&T 含量测定 AR,99.0% >98.0% 90.0%GC 99.0%LC ACS 96.0%GC&T 供检查用 超干级, 99.99% metals basis >97.0%(GC) 95.0%LC&T 96.0%T 98.0%N&T >98.0%(HPLC)(T) 供 HPLC 法含量测定用 >98.0%(GC)(T) 98.0%GC&N AR,99.5% ≥99.99% metals basis 98.0%T&LC 超干级, 99.99% (REO) >97.0%(T) 80.0%GC 96% 97.0%LC&N 90.0%LC 93.0%GC 96.0%LC 90.0%T 94.0%GC 供 HPLC 法测定用 85.0%GC 97.0%N 99.5% metals basis 99.9% AR,98% >95.0%(T) 96.0%LC&T 99.5% 99.95% SP ≥98.0% ≥99% 供 HPLC 法检查用 元素分析仪专用 >95.0%(GC) 90% 95%,99% ee 无水, 粉末, 99.99% metals basis 99.8% 99.995% metals basis 检查 0.1% 99.98% metals basis ACS,≥99.0% HPLC 含量测定 含量/限量测定用,鉴别/检查 用 >98.0%(HPLC)(N) 40-60目 60-80目 70.0%GC 80-100目 93.0%T 97%,>99% ee 99.0%LC&N 99.9%-Ce(REO) CP,98.0% ≥97.0% 供含量测定 供鉴别或含量测定用 供鉴别用 含量 鉴别/检查用 >95.0%(HPLC) 97.0%GC&N 99.5%T Type:Concentration:200ug/ml in high-purity Hexane;US EPA Methods:625,8270C ≥90% 供 HPLC 法系统适用性试验用 >96.0%(T) >97.0% 85.0%T 99.8%GC 99.9%-Er(REO) 99.998% metals basis 99.9999% metals basis 供 HPLC 含量测定用 指示剂 无水, 粉末, 99.9% metals basis 无水,99.99% metals basis 0.04% 1%（w/v）in water 1000μg/mL in Acetonitrile，不确定度2% 60.0%GC 95.0%LC&N 95.0%N 96.0%N 98.0%T&GC 99.8% metals basis 99.9%-Gd(REO) 供 UV 法测定用 无水级,99.99% metals basis 超干级, 99.9% metals basis >97.0%(GC)(T) >99.0%(T) 0.1%（w/v）in water 0.85-1.7mm,元素分析仪专用 5% on activated carbon50-70% wetted powder 75.0%GC 80.0%LC 85.0%LC 92.0%GC 93.0%LC 99.9%-La(REO) 99.99% AR,97.0% AR,98.0% AR,≥99.0% CP GR,99.5% 供鉴别和含量测定用 超干级, 99.9% (REO) 鉴别 >95.0% >96.0%(GC) >96.0%(HPLC) >99.0%(GC) 0.05%（w/v）in water 80.0%T 90.0%E 97.0%N&T 98.5%GC 98.5%T 99% metals basis 99.9% trace metals basis 99.9%-Nd(REO) 99.9%-Pr(REO) 99.9%-Sm((REO)) 99.99%-Ta ACS,98.0-102.0% AR,≥99.5% CP,99.0% Type:Concentration:1,000ug/ml in high-purity Hexane;US EPA Methods:625,8270C Φ:0.5mm,元素分析仪专用 ≥95%，≥99% ee ≥96% ≥99.0% ≥99.9% metals basis 供 GC 法检查用 供 TLC 法检查用 无水级,99.9% metals basis 超干级, 99.95% metals basis >90.0%(HPLC) >93.0%(GC) >97.0%(HPLC)(T) >97.0%(N) 0.05% 0.4% 0.5%（w/v）in water 1% 100μg/mL in Methanol，不确定度3% 5% on activated carbon, reduced,50% water wet paste 70.0%LC 75.0%LC 80% 85.0%E 90%LC 90.0%LC&N 90.0%LC&T 90.0%N 93% 94.0%LC 94.0%T 95.0%E 96.0%LC&N 97%(10 wt% in hexanes) 97+% 98.0% 99%,99.9%-Ir 99.0%N 99.9%-Eu(REO) 99.9%-Re 99.99% metals basis,≥200目 99.997% metals basis ACS, 99% ACS, ≥99.0% ACS,≥99.5% AR,96.0% AR,97% CP,98% GC 含量测定 HPLC 检查 tech. grade ≥94% ≥95.0% 供 GC 法含量测定用 供 HPLC 法含量测定 供 HPLC 法和 GC 法含量测定用 供 IR 鉴别用 供含量测定；供 HPLC 法测定 供效价测定用 供有关物质检查用 供残留溶剂检查用 供鉴别与含量测定用 无水,99.9% metals basis 无水级,99.8% 红外碳硫分析仪专用 红外鉴别 高纯级 >90.0%(GC) >90.0%(T) >93.0%(T) >95.0%(GC)(T) >95.0%(HPLC)(T) >97.0%(HPLC) >98.0%(HPLC)(W) >98.0%(N) (99.9%-Yb) ((REO)) 0.05000mol/L(0.05M) 0.1M 0.2% 0.5 M in THF 0.5% 1% on polyethylenimine/SiO2 1.0 M in methylene chloride 1000μg/mL in Methanol，不确定度2％ 100μg/mL in Acetonitrile，不确定度3% 100μg/mL in Acetonitrile，不确定度3％ 1mol/L 40-60目,可用于农药和生化样品分析 40-60目,吸附性较弱,可用于极性及高沸点样品分析 40-60目,用于烃类和弱极性样品分析 40-60目,高沸点化合物,微量水分析 40.0%LC 5% on activated peat carbon, reduced,50% water wet paste 5% on activated wood carbon, reduced, dry 5% on activated wood carbon, reduced,50% water wet paste 5% on silica powder, reduced, dry 50% water-wet paste 50.0%GC 50nm,99.9% metals basis 60-80目,可用于农药和生化样品分析 60-80目,吸附性较弱,可用于极性及高沸点样品分析 60-80目,用于烃类和弱极性样品分析 60-80目,高沸点化合物,微量水分析 65.0%GC 80-100目,可用于农药和生化样品分析 80-100目,吸附性较弱,可用于极性及高沸点样品分析 80-100目,用于烃类和弱极性样品分析 80-100目,高沸点化合物,微量水分析 85% 85.0%LC&E 85.0%N 88.0%GC 90%NMR 93.0%GC&T 93.0%LC&T 96.0%GC&N 96.0%T&LC 96.5% 97%,99% ee 97.0%E 97.0%W 97.0% 98% MOF 98%,99.9%-Au 98.0 % 98.0%N&LC 98.0%T&N 99%,100-300nm 99%,50nm 99%,99.9%-Nd(REO) 99%,99.9%-Os 99%,99.9%-Ru 99.7% 99.9% metal basis 99.9% metals basis,100nm 99.9% metals basis,1μm 99.9% metals basis,50nm 99.9% metals basis,≥200目 99.9% metals basis,无水级 99.9% metals basis，0.5-5.0μm 99.9%(REO) 99.9%-Ag 99.9%-Cs 99.9%-Dy(REO) 99.9%-Sc(REO) 99.9%-Sm(REO) 99.9%-Sr 99.9%-Ta 99.9%-Tm(REO) 99.97% metals basis 99.99% metals basis,无水 99.99% metals basis，0.5mm 直径 99.999% metals basis,1-3mm 99.999% metals basis,≥200目 99.999%-Ge 99.999%-Si 99.999% ACS, ≥98% ACS, ≥99% ACS, ≥99.5% AR,>99%(GC) AR,95% AR,96% AR,99% metals basis AR,99.0 % AR,99.8% AR,≥98% GR,99.8% HPLC 系统适用性试验用 ULC-MS USP mixture of (C2H5)×C6H6η× where x = 0-4) powder, <5 μm, ≥96% pure, <20nm in acetone at 100mg/Lsurfactant and reactant-free pure, <20nm in water at 100mg/Lsurfactant and reactant-free, stabilized with < 0.01 mmol/l of citrate pure, <20nm in water at 500mg/Lsurfactant and reactant-free, stabilized with < 0.01 mmol/l of citrate ≥95%45-55% in water ≥98%(10 wt% in hexanes) ≥98%(R,R)-Et-DUPHOS-Rh ≥98%(R,R)-Me-DUPHOS-Rh ≥98%(S,S)-Me-DUPHOS-Rh ≥98.0%(GC) ≥99.5% ≥99.95% metals basis ≥99.99% trace metals basis ≥99.99% ≥99.999% metals basis ≥99.999% 供 HPLC 检查用 供 HPLC 法测定 供 HPLC 法鉴别及含量测定用 供 HPLC 系统适用性用 供 HPLC 系统适用性试验用 供 HPLC 限度检查用 供 IR 鉴别和 HPLC 法含量测定 用 供 TLC 鉴别用 供含量测定用。 供检查项对照用 供熔点温度计校准用 供系统适用性试验用 供脂肪酸组成检查用 分析标准品 基质:SiO2,表面基团:-NH2,粒径:0.1-1μm,单位:5mg/ml 基质:SiO2,表面基团:-NH2,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-NH2,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-NH2,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-NH2,粒径:4-5μm,单位:10mg/ml 无水,粉末,99.9% metals basis 无水、粉末、99.99% 无水级, 99.5% 无水级,99% 检查用 熔点对照品 用于GC衍生化，0.1 M in Chloroform 直径：0.1-4μm 直径：0.2-10μm 层数：1-10 直径：20-500nm 粉末,99.99% metals basis 药用级 超干级, 99.99%metals basis 醇溶液0.1% >85.0%(GC) >92.0%(T) >93.0%(HPLC) >93.0%(N) >94.0%(HPLC) >95% >95.0%(HPLC)(N) >95.0%(N)(T) >95.0%(N) >96.0%(HPLC)(N) >96.0%(HPLC)(T) >96.0%(N) >96.0% >97% >97.0%(GC） >97.0%（HPLC） >98% >98.0%(N)(T) >99%(GC) >99.0%(GC)(T) >99.5%(GC) >99.5%,粒径<5.0um >99.8%(GC) >99.9% (GC) <100 nm 粒径(DLS), 30 wt. % 异丙醇溶液 <160 nm particle size(BET),98% <200 nm,99.9% metals basis <30nm,纯度≥99.5% -325 目, 99.9% metals basis -325 目,99% -325 目 0.01000mol/L(0.01M) 0.01600mol/L(0.016M) 0.01M 0.01表观摩尔 0.02% （w/v）in water 0.02% 0.02%（w/v）in isopropyl alcohol 0.02%（w/v）in water 0.025表观摩尔 0.02表观摩尔 0.04% (W/V) in isopropyl alcohol 0.04% (w/v) in carbinol (methanol) 0.04% 水溶液 0.04%(w/v) in water 0.04%（w/v） in water 0.04%（w/v）in isopropyl alcohol 0.04%（w/v）in water 0.0423611111111111 0.05 M聚（二甲基硅氧烷）,乙烯基封端 0.05 g/mL CuSO4 0.05%（W/V）in water 0.05025mol/L 0.05M 0.1 M in THF, contains samarium chips as stabilizer 0.1 M in poly(dimethylsiloxane), vinyl terminated 0.1 g/mL NaOH 0.1% (W/V) in isopropyl alcohol 0.1% (w/v) in isopropyl alcohol 0.1% (w/v) in methanol (methanol) 0.1% in water 0.1%(w/v) in water 0.1%（W/V）in water 0.1%（w/v）in 50% Methanol 0.1%（w/v）in Acetic Acid 0.1000mol/L(0.1M) 0.1003mol/L 0.1M NaCl 0.1M in H2O（20℃） 0.1M in THF 0.1mm,99.9% metals basis 0.1mm,99.99% metals basis 0.1mm,99.999% metals basis 0.2% (w/v) in methanol (methanol) 0.2%（w/v） in water 0.2%（w/v）in Acetic Acid 0.2%（w/v）in water 0.2%（w/w）in Sodium chloride 0.2-0.5mm,元素分析仪专用 0.25%（w/v）in water 0.2M in H2O(20℃) 0.3% 0.3%（w/v）in water 0.4%（W/V）in water 0.4%（w/v）in water 0.5% on alumina, reduced 0.5% on alumina 0.5% on titanium silicate, 50% water-wet paste 0.5% stabilized aqueous solution 0.5%（w/v）in water 银量滴定法中的吸附指示剂 0.5%（w/v）in water,含0.5% KI 0.5-1.0mm,元素分析仪专用 0.5-1mm,元素分析仪专用 0.6%（w/v）in water 0.601mg/L,in water（稀释后） 0.7-1.2mm,元素分析仪专用 0.8-2mm,元素分析仪专用 0.85-1.7mm，元素分析仪专用 1 wt % loading, activated synthetic carbon pellet 1 wt % loading, activated synthetic carbon powder 1 μm,98.5% 1% (w/v) Alcoholic Solution 1% in Acetic Acid 1% in Ethanol 1% on Titaniaanatase/rutilesurfactant and reactant-free 1% on Titaniaanatasesurfactant and reactant-free 1% on carbon blacksurfactant and reactant-free 1%（w/v）in methanol （甲醇） 1%（w/v）in water 吸附指示剂 1%（w/w）in Sodium chloride 1-10 μm，98% 1-3μm,元素分析仪专用 1.0 M in THF 1.0 M in tert-Butanol 1.0 M 1.0-2.2 1.0M in THF, in Sure/Seal™ bottle 1.2-2.5mm,元素分析仪专用 1.35-4.29mg/L,in water 1.5 M in THF 1.5-2.5mm,元素分析仪专用 1.50mg/L,in water 1.51-14.8(mg/L),分析标准品 1.6% 1.8 M in THF 10% Pd 10% on Titaniaanatase/rutilesurfactant and reactant-free 10% on Titaniaanatasesurfactant and reactant-free 10% on activated carbon, Pearlman(50-70% wetted powder ) 10% on activated carbon, reduced, dry powder 10% on activated carbon 10% on activated wood carbon, reduced,50% water wet 10% on activated wood carbon, unreduced,50% water wet 10% on carbon blacksurfactant and reactant-free 10-15%Nd 10-50 nm, 20% in H2O 100 mesh, 99.9% metals basis 100-200 mesh 100-200目,已活化 100-200目 100-200目≥75%,已活化 100-200目≥75% 100-300 nm, 25% in H2O 1000ppm,粒径：10-15nm 1000ppm,粒径：2nm 1000ug/ml in 1%acetic acid 1000ug/ml in H2O 1000μg/mL in Acetonitrile，不确定度2％ 1000μg/mL in Hexane，不确定度2％ 1000μg/mL in Methanol，不确定度2% 1000μg/mL in Methanol，不确定度3% 1000μg/mL 100mM aqueous solution 100mg/L 100ug/ml in 0.05% NaOH 100ug/ml in 1%HCl 100μg/mL in Acetonitrile，不确定3% 100μg/mL in Hexane，不确定度3% 100μg/mL in Hexane，不确定度3％ 100μg/mL in Methanol，不确定度3％ 10nm ,98% metals basis,γ型 11.7-13.0% B 12.1±1.1μg/L 12.5% (w/v) 12.8μg/L，分析标准品 14 wt.% in methanol 15%-20%in sulfuric acid 15%Mo 15%（v/v）in iso-Propyl alcohol（异丙醇） 15-30nm，5mg/ml in H2O 15.3% Pt 1M LiCl 1M or 10%KNO3 1mg/ml in 1.0mol/L HNO3 2 M in H2O 2% (w/v) Alcoholic 2%（w/v）in water,含5% KI 2%（w/v）in water 2-4mm 空心球, 元素分析仪专用 2.0 M in THF 20% Pd(OH)2 20% in tetrahydrofuran 20% on carbon blacksurfactant and reactant-free 20-30目,元素分析仪专用 20-40目 GC 20-500 ug/L, in 1% HNO3 200-300目 ≥70% 200-300目,已活化 200-300目 200-300目≥70% ,已活化 200-300目≥70% 200ug/ml in hexane 20nm-50nm，99.5% metals basis 21.6µg/L 23K 25%,COD≥20万mg/L 2M NH4Cl 3% on activated carbon, reduced,50% water wet paste 3% on activated carbon, sulfided50-70% wetted powder 3% on activated wood carbon, reduced70% water wet paste 3% on polyethylenimine/SiO2 3.0-5.0mm,元素分析仪专用 3.7% 3.86μg/mL 30 nm 粒径, 20 wt. % 异丙醇溶液 30% on carbon blacksurfactant and reactant-free 30%,PH 2~3(1%溶液) 30%,PH 6.8~8.5(1%溶液) 30% 30-40% in heavy naphtha(2-2.5% Cr) 30K 30nm 粒径, 20 wt. % 水溶液 30nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 30nm,99.5% metals basis,α型 32%-34% 活性含量(以碱计) 33-35% TiO2 34~38% 35% in naphthenic acid, 2.8-3.2% V 35% in naphthenic acid,2.8-3.2% V 35%-39%(以BHMTPMPA计) 35.0-42.0% Ru basis 38-42% aqueous solution 39-44% B2O3 basis, 31-37% CaO basis, powder 39.0%T 3mol/L,pH5.5 4% Ca 40% in 2-ethylhexanoic acid(3-8% Ca) 40% solution in mineral spirits (6% Mn) 40-60目 GC 40-60目,C1-C2烃,CO,CO2,C2H2,C2H4,C3H6分离 40-60目,C1-C4烃类分析 40-60目,乙烃,HCL分析 40-60目,气体,半水煤气等分析 40-60目,气体中微量水分析 40-60目,气体烃,甲醇中水等分析 40-60目,氯化氢,氨,甲醛中水和水中氨等分析 40-60目,氯化氢,氨,甲醛中水等分析 40-60目,永久性气体,气体中微量水分析 40-60目,用于极性,高沸点样品分析 40-60目,用于极性、高沸点、生化样品分析 40-60目,稀有气体、永久性气体、C1-C3烃类气体分离 40-60目,较高沸点样品分析 40-60目,醇类,芳烃等分析 40.5%-42.5%Pb 44-48% CuO 45 wt. % in H2O 45 wt. % in water 45% FeCl3 basis 45%-50% 活性组分 45-55%溶液 47%-53%(以酸计) 48-50% Ni basis,150μm 48-50% Ni basis,20-40目 48-50% Ni basis,50μm 48-50% in THF contains >0.5% sulfur dioxide as peroxide formation suppressor 4M KCL(含Ag/AgCl) 4M LiCl 4N，靶材专用 5 wt % loading, activated synthetic carbon powder 5% Pt，99.95% metals basis 5% on activated carbon (50-70% wetted powder) 5% on activated carbon, reduced, 50% water wet paste 5% on activated carbon, reduced, dry powder 5% on activated carbon, unreduced,50% water wet paste 5% on activated carbon50-70% wetted powder Evonik Noblyst® P1093 5% on activated carbon 5% on activated wood carbon, unreduced,50% water wet paste 5% on alumina powder, reduced, dry 5% on alumina 5% on alu≥a powder, reduced, dry 5% on alu≥a, reduced, dry powder 5% on barium carbonate, reduced 5% on barium sulfate, reduced 5% on barium sulfate, unreduced 5% on calcium carbonate, lead-poisoned 5% on calcium carbonate, unpoisoned, reduced 5% on calcium carbonate, unpoisoned, unreduced 5% on calcium carbonate, unreduced, dryEscat™ 2371 5% on calcium carbonate, unreduced, dry 5% on carbon blacksurfactant and reactant-free 5% 5%水溶液 5-10 nm 粒径, 20 wt. % 水溶液 5-9μm,元素分析仪专用 5.6% 50 wt. % in H2O,99.9% metals basis 50 wt. % in H2O 50 wt.% solution in THF 50% aqueous solution,99.9%-Eu(REO) 50% aqueous solution,99.9%-Lu(REO) 50% aqueous solution,99.9%-Nd(REO) 50% aqueous solution,99.9%-Pr(REO) 50% aqueous solution,99.9%-Sm(REO) 50% aqueous solution,99.9%-Tb(REO) 50% aqueous solution,99.9%-Yb(REO) 50% aqueous solution，99.9%-Dy(REO) 50% aqueous solution，99.9%-Er(REO) 50% in water 50% w/w 水溶液, 试剂级 50% water-wet pasteNanoselect Pt-200 50%水溶液 50-150 nm, 20% in H2O 50-300nm，97% trace metals basis 50-54% Re,99.99%-Re 50-60% ZnO2 50-70% wetted powder 500mg/L in 1%HCl 50:50的混合物 50K 50nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 50nm,99% 50nm,99.5% metals basis 50nm,99.99% metals basis 55 wt. % in H2O 55% 59% Pt 59.0% 5mg/ml in H2O 5mm×5mm 厚2mm 正方形 Ge≥99．999％ 5mol/L,pH4.8 6% Mn 60 wt. % in H2O 60% in toluene6-8% Ni 60+, high-cross linking (PhosphonicS SPM36) 60-100目 60-80目 GC 60-80目,C1-C2烃,CO,CO2,C2H2,C2H4,C3H6分离 60-80目,C1-C4烃类分析 60-80目,乙烃,HCL分析 60-80目,气体,半水煤气等分析 60-80目,气体中微量水分析 60-80目,气体烃,甲醇中水等分析 60-80目,氯化氢,氨,甲醛中水和水中氨等分析 60-80目,氯化氢,氨,甲醛中水等分析 60-80目,永久性气体,气体中微量水分析 60-80目,用于极性,高沸点样品分析 60-80目,用于极性、高沸点、生化样品分析 60-80目,稀有气体、永久性气体、C1-C3烃类气体分离 60-80目,较高沸点样品分析 60-80目,醇类,芳烃等分析 60nm,99.9% metals basis 65-70% P2O5 basis 69- 80 %（cu%），工业级 7.4% 7.5% (w/v) 75%,消毒用 75%,消毒用，喷雾瓶装 75% 78% in 2-ethylhexanoic acid10-15% Ni 78.0%GC 8% Cu 8-10%Sm 80-100目 GC 80-100目,C1-C2烃,CO,CO2,C2H2,C2H4,C3H6分离 80-100目,C1-C4烃类分析 80-100目,乙烃,HCL分析 80-100目,气体,半水煤气等分析 80-100目,气体中微量水分析 80-100目,气体烃,甲醇中水等分析 80-100目,氯化氢,氨,甲醛中水和水中氨等分析 80-100目,氯化氢,氨,甲醛中水等分析 80-100目,永久性气体,气体中微量水分析 80-100目,用于极性,高沸点样品分析 80-100目,用于极性、高沸点、生化样品分析 80-100目,稀有气体、永久性气体、C1-C3烃类气体分离 80-100目,较高沸点样品分析 80-100目,醇类,芳烃等分析 80.0%E 80.0%LC&T 80.0%NMR 800目 83.0%LC 85.0%V 87.0%GC 89.0%GC 9% Fe 90% [cataCXium® PCy] 90%(v/v)乙醇内含0.05%（w/v） 90%(~4% Fe, ~6% Ba+Al) 90.0%NMR 92% 92.0%LC 92.0%T 93.0%E 94% 94.0%N 94.0%T&LC 95% metals basis 95%(10wt% in hexanes) 95%(P2O5:63%±2%,Al2O3:17%±1%) 95%,98% ee 95%[dichloride chloride dihydrate FixCat] 95+% 95.0 % 95.0%GC&NMR 95.0%N&T 95.0%NMR 95％ 96%,含4-10%冰醋酸稳定剂 97% (R,R,R)-(+)-Ph-SKP 97% (S,S,S)-(-)-Ph-SKP 97% (S,S,S)-(-)-Tol-SKP 97% (S,S,S)-(-)-Xyl-SKP 97%(>99% ee)[(R)-DTB-SpiroSAP-Bn] 97%(>99% ee)[(R)-Ph-SpiroSAP-Ph] 97%(>99% ee)[(R)-Xyl-SpiroSAP-Ph] 97%(>99% ee)[(S)-DTB-SpiroSAP] 97%(>99%ee)[(R)-DTB-SpiroSAP-Ph] 97%(＞99% ee)[(R)-DTB-SpiroSAP] 97%, 粉末 97%,99.999%-Au 97%,含1~2%乙酰丙酮稳定剂 97%2-5 nanometers 97%，may also contain SrCO3 97+%(10 wt% in hexanes) 97.0 % 97.0%T&LC 97.0%T&N 98% (99.9%-Tm) ((REO)) 98% EtCPhos 98% RockPhos 98% metals basis,≤100nm,金红，亲水 98% metals basis 98%(>99% ee)(S)-DTB-SpiroPAP-3-Me 98%(mixture of endo and exo isomers)(10 wt% in hexanes) 98%(mixture of isomers) 98%, 50-1150, contained in 50 ml Swagelok® cylinder(96-1070) for CVD/ALD 98%, 氯化铪≤2% 98%,0.01% 氢醌稳定剂 98%,4 ～ 8μm 98%,400目 98%,99% de 98%,99.7%-Hf 98%,99.9%-Bi 98%,99.9%-Gd(REO) 98%,99.9%-Ir 98%,99.9%-La 98%,99.9%-Pt 98%,99.99%-Al 98%,≥200目 98%,无水级 98%,用于植物细胞培养 98%GC&T 98%，99.9%-Al 98+%-Hf, 1.5% Zr 98+% 98.0% metals basis,≤100nm 98.0%LC&E 98.0%LC&GC 98.0%LC&W 98.0%T&QNMR 98.0%W 98.5% metals basis(去除Mg), Mg <1% 98.5%GC&T 98.5%LC&T 98.5% 99 atom % 13C 99% (99.9%-Tb) ((REO)) 99% (99.9%-Yb) ((REO) 99% (99.99%-Ti 99% (99.999%-Si) 99% metals basis 300-500nm 99% metals basis,1-4μm 99% metals basis，≤100nm 99% metals basis，≤5μm 99%(10 wt% in hexanes) 99%(99.9%-Sc)((REO) ) 99%(REO) 99%(metals basis 去除铪) 99%, 22-1050, contained in 50 ml Swagelok® cylinder(96-1070) for CVD/ALD 99%, 99.999%-Si 99%,15% Se, dissolved in TOP 99%,1~2μm 99%,1μm 99%,2-4μm 99%,50目 99%,6-10μm 99%,7% S, dissolved in TBP 99%,99.9%-Er(REO) 99%,99.9%-In 99%,99.9%-La(REO) 99%,99.9%-Pr(REO) 99%,99.9%-Rh 99%,99.9+%-Au 99%,99.9+%-Lu(REO) 99%,99.99%-Hf, <0.15% Zr TEMAH, , 72-7720, contained in 50 ml Swagelok® cylinder96-1070 for CVD/ALD 99%,99.99%-Hf, <0.15% Zr TEMAH 99%,99.99%-Hf, <0.2% 99%,99.995+%-Re 99%,ACS 99%,≥200目 99%,≥325 目,粉末 99%,无水级 99%,水分≤1.0% 99%,用于HPLC衍生标记 99%,粒状 99%,颗粒 99%-Cr 99%-Se 99%contains about 10% o-chlorotoluene NiCl(o-tolyl(TMEDA 99%（99.9%-Ag） 99%，-325目 99%，≤100nm 99%，粒径:≤150um 99+%-Al（1/4'' and down pieces） 99+%-Ti 99+% 99.0% metals basis,20nm 球形 99.0%GC&LC 99.0% 99.5% (metals basis excluding Sr), Sr <500ppm 99.5% (metals basis 去除铪) ,100-325目 99.5% (metals basis 去除铪),1-3μm 99.5% (metals basis 去除铪).10μm 99.5% (metals basis) 99.5% (metals basis,锆除外), Zr <1% 99.5% metals basis (铪除外),≥200 目 99.5% metals basis, <50 nm 99.5% metals basis,<100 nm 99.5% metals basis,<2 μm 99.5% metals basis,1-3 μm 99.5% metals basis,100目 99.5% metals basis,10μm 99.5% metals basis,150-250nm 99.5% metals basis,150nm,锐钛，亲水 99.5% metals basis,2-10 μm 99.5% metals basis,2.0μm 99.5% metals basis,200-400目 99.5% metals basis,200目 99.5% metals basis,20nm 99.5% metals basis,50-100nm 99.5% metals basis,60目 99.5% metals basis,≤10μm 99.5% metals basis,≤5 μm 99.5% metals basis,≥100目 99.5% metals basis,≥200目 99.5% metals basis,≥325 mesh 99.5% metals basis,≥325目 99.5% metals basis,＜20 μm 99.5% metals basis，60-120nm,含松香分散剂 99.5% metals basis，≤45um 99.5% metals basis，粉末, 2 μm 99.5% metals basis，粉末 99.5% metals basis，锭 99.5%,100-325目 99.5%,60目 99.5%,≤3 μm 99.5%,≤30μm 99.5%,粉末 99.5%-Mo 99.5%-Sr 99.5%-Te 99.5%GC&T 99.5%LC&T 99.5%metals basis 99.5%，粒径≤5μm 99.5％ metals basis,60nm,金红 99.6% metals basis 99.6%，1-3μm 99.7%-V 99.7%，≥200目 99.8% metals basis,<100 nm (BET) 99.8% metals basis,<150nm 99.8% metals basis,100-300nm,金红,亲水 99.8% metals basis,100nm,金红,亲水 99.8% metals basis,100nm,金红,亲油 99.8% metals basis,100nm,金红，亲油（包覆前） 99.8% metals basis,100nm,锐钛,亲水 99.8% metals basis,10nm-25nm,锐钛，亲水 99.8% metals basis,20μm 99.8% metals basis,25nm,金红,亲水 99.8% metals basis,30nm,锐钛,亲水 99.8% metals basis,40nm,金红,亲水 99.8% metals basis,40nm,锐钛，亲水 99.8% metals basis,5-10nm,锐钛,亲水亲油型 99.8% metals basis,5-10nm,锐钛，亲水型 99.8% metals basis,60nm,锐钛,亲水 99.8% metals basis,60nm,锐钛,亲油(硬脂酸处理) 99.8% metals basis,60nm 99.8% metals basis，50±10nm 99.8% metals basis，90±10nm 99.8% metals basis，＜5nm，锐钛，亲水亲油型 99.8% trace metals basis 99.8%, Ta-0.1-1% 99.8%,10μm,,高白度 99.8%,25μm 99.8%,D50 0.5-1.5μm 99.8%,H2O: ≤0.005% 99.8%,≥325目 99.8%-Th 99.8%T 99.8%，6.35mm (0.25in) dia x 6.35mm (0.25in) length 99.9 %-Bi, ~60% in neodecanoic acid15-20% Bi 99.9% (REO) 99.9% (metals basis 去除 Zr), Zr <0.5% 99.9% metal basis，D50 ≤10μm 99.9% metals basis ,无水 99.9% metals basis(~1% 锆除外) 99.9% metals basis,<100 nm particle size (SEM) 99.9% metals basis,<100 nm(SEM) 99.9% metals basis,<150 μm 99.9% metals basis,<50 nm 99.9% metals basis,,液体石蜡保存 99.9% metals basis,100-200 mesh 99.9% metals basis,10μm 99.9% metals basis,2 μm 99.9% metals basis,2-4μm 99.9% metals basis,200-400目 99.9% metals basis,200nm 99.9% metals basis,200目 99.9% metals basis,20nm 99.9% metals basis,25μm 99.9% metals basis,2～10μm 99.9% metals basis,30±10nm 99.9% metals basis,400nm 99.9% metals basis,5-10μm 99.9% metals basis,5μm 99.9% metals basis,60-80nm 99.9% metals basis,Ir ≥84.5% 99.9% metals basis,γ相,10nm 99.9% metals basis,γ相,＜50nm 99.9% metals basis,≤0.5μm，含约1%聚丙烯酸铵分散剂 99.9% metals basis,≤10μm 99.9% metals basis,≤1μm 99.9% metals basis,≥325目 99.9% metals basis,≥625目 99.9% metals basis,不规则片状 99.9% metals basis,无水 99.9% metals basis,棒 99.9% metals basis,正交晶系 99.9% metals basis,粉末,≥200目 99.9% metals basis,粒径≤1μm 99.9% metals basis,颗粒：1-5mm 99.9% metals basis,黄色 99.9% metals basis,＜100nm 99.9% metals basis，1-10mm 99.9% metals basis，1～2μm 99.9% metals basis，50-70nm 99.9% metals basis，D50(0.2～1μm) 99.9% metals basis，≤0.2μm 99.9% metals basis，≤100nm 99.9% metals basis，≤10um 99.9% metals basis，≥200目 99.9% metals basis，≥200目，粉末 99.9% metals basis，粉末,≥100 mesh 99.9% metals basis，粉末 99.9% metals basis，粒径（D50）≤20μm 99.9%((REO) 99.9%,40-60nm 99.9%,80-100nm 99.9%-As 99.9%-Au 99.9%-Eu 99.9%-Hf, Zr<1.5% 99.9%-Ho(REO) 99.9%-In 99.9%-Mn 99.9%-Mo 99.9%-Nb 99.9%-Nd 99.9%-Pt 99.9%-Si 99.9%-Sn 99.9%-Tb(REO) 99.9%-Tb（(REO)） 99.9%-Th 99.9%-Tm((REO)) 99.9%-Yb （(REO)） 99.9%T 99.9%metals basis 99.9%，粉末 99.9%，粒径≤30μm 99.9+%-As 99.9+%-Au 99.9+%-W,WO2.9 Blue Sub-oxide 99.9+%-W 99.95% (metals basis 去除 Zr), Zr <1% 99.95% except for Ta 99.95% mentals basis 99.95% metal basis 99.95% metals basis ,白色 99.95% metals basis,<50 nm (SEM) 99.95% metals basis,1-6mm 99.95% metals basis,25 μm 99.95% metals basis,≤10 μm 99.95% metals basis,≥325目 99.95% metals basis,含有少量氧化铅 99.95% metals basis,无水 99.95% metals basis，≤10 μm,含松香分散剂 99.95% metals basis，＜10 μm 99.95% trace metal basis 99.95%,Φ0.5mm电容器用 99.95%-Ti 99.95+%-Os 99.95+% 99.97% metals basis,正交晶系 99.98% metals basis,<100 ppm Rb, <50 ppm Cs 99.98% metals basis,1-5μm 99.98% metals basis,粒径:≤150um 99.98% trace metals basis 99.98%,35.3 %焦硼酸锂64.7 %偏硼酸锂 99.98%,67％焦硼酸锂33%偏硼酸锂 99.98%-Os 99.99 %-Ca 99.99 +%-Ge 99.99% (REO) 99.99% (metals basis 去除 Zr), Zr <0.3% 99.99% Si 99.99% metals basis 0.5-2mm 99.99% metals basis(去除Hf or HfO2),≤100nm 99.99% metals basis,<100 nm(TEM) 99.99% metals basis,<50 nm(TEM) 99.99% metals basis,1-3mm 99.99% metals basis,100目 99.99% metals basis,12μm 99.99% metals basis,25μm 99.99% metals basis,2～10μm 99.99% metals basis,3.3-4.3μm,粉末 99.99% metals basis,600目 99.99% metals basis,granular 99.99% metals basis,powder 99.99% metals basis,γ相,20nm 99.99% metals basis,≤45um 99.99% metals basis,≥300目 99.99% metals basis,晶型α,0.20μm 99.99% metals basis,晶型α,0.40μm 99.99% metals basis,晶型γ,≤20nm 99.99% metals basis,粒径<5mm 99.99% metals basis，<5 μm 99.99% metals basis，0.1mm 直径 99.99% metals basis，0.25mm 直径 99.99% metals basis，1-3mm 99.99% metals basis，1mm 直径 99.99% metals basis，50-70nm 99.99% metals basis，≤0.2μ m，含松香分散剂 99.99% metals basis，无水级 99.99% metals basis，用于光学玻璃 99.99% metals basis，用于镀膜 99.99% metals basis，粒状，1-3mm 99.99% metals basis，＜50nm 99.99%(REO) 99.99%-Ce(REO) 99.99%-Cr 99.99%-Ga 99.99%-Hg 99.99%-La(REO) 99.99%-Na 99.99%-Pb 99.99%-Sc(REO) 99.99%-Sr 99.99%-Ta P， resublimed 99.99%-Ti 99.99%-Yb(REO) 99.99%metals basis 99.99+%-Ge,contains 1-5% germanium metal 99.995% trace metals basis,powder 99.995%-Mn 99.995%-Si 99.995+%-Cd 99.995％ metals basis,3-6mm 99.996% metals basis 99.998% metals basis ,块状 99.998%-Ta 99.999% metais basis 99.999% metals basis ,无水 99.999% metals basis,>200目 99.999% metals basis,1-10mm 99.999% metals basis,1-6mm 99.999% metals basis,2-3cm 99.999% metals basis,2-7mm 99.999% metals basis,≥100目 99.999% metals basis,正交晶系 99.999% metals basis，1-6mm 99.999% metals basis，1-6mm，颗粒 99.999% metals basis，粒状，1-3mm 99.999% trace metals basis,powder 99.999%(metals basis) 99.999%-K 99.999%-La 99.999%-Nb 99.999%-Ni 99.999%-Pt 99.999+% 99.9995% metals basis 99.9998% metals basis 99.9998% metas basis 99.9999% metals basis,1-5mm 99.99999% metals basis AAS ACS reagent, 99% ACS reagent, ≥99% ACS reagent, ≥99.0% ACS reagent, ≥99.5% ACS, 79.5-81.0% ACS, 81-83% as MoO3 ACS, 98.0% ACS, 98.0-101.0% ACS, 98.0-102.0% ACS, 99-102.0% ACS, 99.95-100.05% ACS, Pt 37.5% min ACS, ≥93.0% ACS, ≥95.0% ACS, ≥98.0% (RT) ACS, ≥98.0% ACS, ≥99.5%，水分≤0.2% ACS, ≥99.9% ACS,98% ACS,98.0-103.0% ACS,98.5-102.0% ACS,99.0%,正交晶系 ACS,99.0% ACS,99.0-101% ACS,99.0-101.0% ACS,99.9995% metals basis ACS,≥80.0% ACS,≥90% ACS,≥96.0% ACS,≥98.0% ACS,≥99% ACS,≥99.0%(GC),contains 250 ppm BHT as inhibitor ACS,≥99.5%,含50-150ppm异戊烯稳定剂 ACS,≥99.9% AR 99.5% AR, ≥98% AR, ≥99.0% AR, ≥99.5% AR,100目 AR,15.0～20.0% TiCl3 basis in 30%HCl AR,50 wt. % in H2O AR,54-57% Cu basis AR,55.3% SnO2 AR,85% AR,85.0% AR,90% AR,90.0% AR,95 % AR,95.0% AR,98.0 % AR,98.5% AR,99.0%,正交晶系 AR,99.5% metals basis AR,99.5%,含50-150ppm异戊烯稳定剂 AR,99.7% AR,99.9% AR,Fe 21-23 % AR,Fe:20.5-22.5% AR,Mn >47% AR,Mo≥61.1 % AR,Pd 46.0 - 48.0 % AR,Pt ≥37.5% AR,bp 30-60 °C AR,bp 60-90 °C AR,bp 90-120 °C AR,≥85.0% MoO3 basis AR,≥92 % AR,≥98.0% (HPLC) AR,≥98.0% AR,≥99% AR,≥99.0% (KT) AR,≥99.5 %,粒径;2-4 mm AR,≥99.7% AR,含4-10%冰醋酸稳定剂 AR， ≥98.0% (RT) AR，75% AR，98%,≥200目 AR，98.5% AR，水分≤0.3% Au 23.5～23.8% in dilute HCl Au 48-50% Au ≥47.5% Au≥82% BF3 46.5% BioReagent, suitable for mouse embryo cell culture C(1/2I2)=0.09992mol/L CP,100目 CP,20-30目 CP,70% CP,94% CP,97% CP,用于合成 CP，10-20目 Ca 6.6-7.4% Cd ≥75% Co：66%-70%，≤85um,分散在水中 Cr 24% Cu含量33%-42.8% Cu含量:55-56% EDTA-Na2Mg, 用于络合, ≥98.5% EP级,平均粒径：0.1-0.3μm Fe,60.0 - 72.0 % Fe含量：1mg/mL；平均粒径：30nm；R2/R1≈4 Fe：29-31% Formulation: 3:2:3:10 Formulation: 3:2:3 GC 检查 GR for analysis ACS,ISO,Reag. Ph Eur GR,95.0% GR,≥99.0%(T) GR,≥99.0% GR,水分≤0.2% HPLC 和 GC 有关物质检查 HPLC 检查用 HPLC 法有关物质测定用 HPLC 法检查 HPLC 法检查用 HPLC 系统适用性试验和检查 用 HPLC 鉴别、溶出度和含量测 定 IR 鉴别和 HPLC 含量测定 IR 鉴别和 HPLC 法含量测定 IR 鉴别和含量测定 In Methanol Ir 18.6% Ir 35% in HCl Ir 48.0 - 55.0 % Ir ≥36% Ir:73% LC-MS LC-MS，无稳定剂 Large, particle size ~900-1000 nm, surface area ~550 m2/g (KCC-1 L3) Large, particle size ~900-1000 nm, surface area ~700 m2/g, (KCC-1 L1) MOFHKUST-1(Cu)/PVDF membrane(35/65 wt.%) Mn >44% Mn ≥71.0%,BET surface Area 5～7 m2/g Mn≥4.0%水溶液 Mo≥50 % N >32.5 %, 5.0 μm Ni27-29% Os 38.7% PT Pb ≥82% Pd 13.0-15.0% Pd 14.5% Pd 15.2% Pd 16.3% Pd 17.7% Pd 18.09 wt. % 硝酸溶液 Pd 18.5% Pd 20.0% Pd 37.3% Pd 5%,poisoned with lead(用铅毒化) Pd 51.2%-53.9% Pd 59-60% Pd ≥26.3% Pd ≥39.0% Pd ≥44% Pd ≥50% Pd ≥8.9% Pd:17.1% Peak Emission 550nm ± 10nm, QY > 75% Peak Emission 590nm ± 10nm, QY > 75% Peak Emission 630nm ± 10nm, QY > 75% Peak Emission 680nm ± 10nm, QY > 75% Peak Emission 800nm ± 10nm, QY > 75% Peak Emission 950nm ± 10nm, QY > 75% Ph. Eur.,BP,100-110%,51.0-59.0% Al2(SO4)3 basis Ph. Eur.,BP,USP,98-102.5% Ph. Eur.,BP,USP,99-100.5% PhosphonicS POCe PhosphonicS POCo PhosphonicS POMn PhosphonicS POVO PhosphonicS SEM26 PhosphonicS STA3 Phosphotungstic acid modified alumina Pt >99.9% metal basis, 10nm Pt >99.9% metals basis, ≤20 μm Pt 10%，水含量≤60% Pt 15.2% Pt 34.0% Pt 44.5% Pt 5%，水含量≤80% Pt 51.6-52.6% Pt 52% Pt 58.0% Pt basis ≥73% Pt ≥41.0% Pt ≥43.4% Pt ≥57% Pt ≥64.5% Pt ≥84.4% Pt, 80-85% Pt,18.02% Pt,65% Pt1%，Φ：1.6-2mm,元素分析仪专用 Pt1%，Φ：2-3mm,元素分析仪专用 Pt5%，Φ：2-3mm,元素分析仪专用 Pt:~2% 二甲苯溶液 Pt:≥58% Pt≥75% Pt：54-56% RH：43.0%-46.6% Ru 1.5% w/v Ru 5%, 含水约50% Ru content 45-55% Ru ≥31.3% SP,powder SP,粉末 TLC 检查 TLC 系统适用性试验 Tetrabutylammonium Hydroxide (37% in Methanol) TiCl3:76.0-78.5% Type:Concentration:1,000ug/ml in high-purity n-Hexane;US EPA Methods:625,8270C Type:Concentration:1000μg/ml in high-purity Hexane;US EPA Methods:625,8270C ULC-MS，无稳定剂 UV 含量测定 UV 和 HPLC 含量测定 UiO-66-BDC-NH2，BDC-NH2：Zr = 0.9-1.0 Viscosity Grade 100 Viscosity Grade 150 Viscosity Grade 46 Viscosity Grade 68 ZrO2>65% analytical standard 0.3 mg/L in 1%HNO3 analytical standard 70?g/L in water analytical standard,0.0213-2.00mg/l in 1%HNO3（稀释后） analytical standard,0.40 mg/L,in 1% HNO3 analytical standard,0.80 mg/L,in 1%HCl analytical standard,1000ug/ml in 2.0mol/L HCl with trace HNO3 analytical standard,20.0mg/ml in 0.06mol/L HCl analytical standard anhydrous flakes, 99% anhydrous,98% anhydrous,99.8% cysteine active site modifier desiccant, with moisture indicator diam. 3 mm, ≥99.95% metals basis diam. 3mm×4mm, 99.99% metals basis dimer solution 97% (1 mM in 0.1 Molar aqueous NaIO3) electronic grade(99.99%-In , 97-3425, contained in 50 ml electropolished Swagelok® cylinder（96-1077） for CVD/ALD electronic grade(99.9999%-Ga ) electronic grade(99.9999%-Ga electronic grade, 99.999% trace metals basis electronic grade,99.99%-In , 97-3425, contained in 50 ml Swagelok® cylinder96-1070 for CVD/ALD electronic grade,99.99%-In electronic grade,99.999%-In , 98-2010, contained in 50 ml electropolished Swagelok® cylinder（96-1077） for CVD/ALD electronic grade,99.999%-In electronic grade,99.9999%-Ga , 98-2000, contained in 50 ml electropolished Swagelok® cylinder（96-1077） for CVD/ALD electronic grade（99.995%-As） for GC derivatization, ≥99.0% for atomic absorption spectroscopy for molecular biology,≥99% for plant cell culture,≥99% for plant cell culture,≥99.0% granular;≥99%, 5-20 mesh green；-325 mesh, 99% large, particle size ~900-1000 nm, surface area ~600 m2/g, (KCC-1 L2) medium, particle size ~300-350 nm, surface area ~600 m2/g, (KCC-1 M2) medium, particle size ~400-450 nm, surface area ~400 m2/g, (KCC-1 M1) mixture of CuO and Cu2O, ACS reagent mixture of isomers pH = 3.0 +- 0.5（FEO-W320） porous,F-free MIL-100(Fe), KRICT F100 [Iron trimesate] powder, <5 μm powder, 2 μm, ≥99% powder, 60 mesh, 99% pure, <20nm in isopropanol at 100mg/Lsurfactant and reactant-free pure, 50-70nm in acetone at 100mg/Lsurfactant and reactant-free pure,<20nm in water at 30mg/Lsurfactant and reactant-free, stabilized with <0.01 mmol/l of citrate purified70-85% Pt reagent grade, 1.0 M in solution reagent grade, 98% reagent grade, ≥98% reagent grade red powder, 1-2 μm, 99% small, particle size ~130-190 nm, surface area ~380 m2/g, (KCC-1 S1) small, particle size ~40-50 nm, surface area ~520 m2/g, (KCC-1 S2) suitable for use as Ph Eur,BP,USP,99.0-100.5% superconductor grade ~60% in neodecanoic acid15-20% Bi superconductor grade(9-11% Ca) superconductor grade, ~60% in toluene6-12% Cu superconductor grade,（16-21%Sr supreme anhydrous grade,99.8%,H2O≤20ppm synthesis grade tech. grade( Siderite) technical type 316 ultra dry with indicator, 8 mesh ~ 11% ethanol/water (85% ethanol and 15% water) ~0.005 M in ethanol(Contain H+), for TLC ~1M aqueous solution ~25% in toluene ~30% in mineral spirits(2% Cr) ~32% in xylene ~40% in 2-ethylhexanoic acid,8-12% Sr ~50 wt. % in water ~7 wt% Pt, ~3.5 wt% Ru Φ3mm-5mm,干燥剂用 Φ4mm-6mm,干燥剂用 Φ4mm高(厚)1mm 圆柱体Ge≥99.999％ Φ5mm 圆珠 中间穿孔 Ge≥99.999％ Φ5mm 高2.5mm 锥形体 Ge≥99.999％ Φ7mm 高2.5mn 锥形体 Ge≥99.999％ Φ7mm高(厚)2.5mm(厚)5mm 圆柱体Ge≥99.999％ α相,30 nm 粒径, 20 wt. % 水溶液 α相混合物，30nm，99.9% α相，150nm，99.9% −100 mesh, 99.9% trace metals basis −325 mesh, 98% ≤100nm,99.5% metals basis ≤100nm，99% metals basis ≤200nm,99.5% metals basis ≤40nm 球形,99.5% metals basis ≤500 nm, 99.9% metals basis ≤50nm ，98% metals basis,γ型 ≤50nm,40 wt. % in H2O ≤50nm,40 wt. % 异丙醇 ≥ 95% ≥. 84% ≥1000μm(≤0.3%),＜200μm(≤15%),≥98% ≥100目,99.9% metals basis ≥125μm(≤0.3%),≥98% ≥140μm(≤0.3%),≥100μm(≤15%),活性铝≥96% ≥160μm(≤0.3%),≥98% ≥180μm(≤10%),＜140μm(≤45%),活性铝≥95% ≥200 mesh particle size ≥200 mesh, fine powder ≥224μm(≤0.3%),≥80μm(≤10%),活性铝≥92% ≥2500μm(≤0.3%),＜200μm(≤15%),≥98% ≥250μm(≤0.3%),≥100μm(≤8%),活性铝≥94% ≥28%(以ATMP计) ≥280μm(≤10%),＜180μm(≤40%),活性铝≥95% ≥30% (以ATMP计) ≥30% ≥355μm(≤0.3%),≥160μm(≤8%),活性铝≥94% ≥355μm(≤5%),≥160μm(≤30%),活性铝≥94% ≥40% ZrO2 basis ≥400 mesh particle size, ≥97.5% ≥500μm(≤0.3%),≥98% ≥56μm(≤0.3%),≥45μm(≤0.5%),活性铝≥82% ≥68% ≥80% ≥80μm(≤1.0%),活性铝≥80% ≥80μm(≤1.0%),活性铝≥82% ≥80μm(≤1.0%),活性铝≥85% ≥80μm(≤1.5%),活性铝≥90% ≥80μm(≤5%),≥98% ≥85% [cataCXium® ABn] ≥85% ≥90.0% ≥93% ≥95% [cataCXium® A] ≥95% [cataCXium® FBu] ≥95% [cataCXium® FSulf] ≥95% [cataCXium® PInCy] ≥95% [cataCXium® POMeCy] ≥95% [cataCXium® POMetB] ≥95% [cataCXium® PlCy] ≥95% [cataCXium® PtB] ≥95%,无定形粉末 ≥95.0 % ≥96.0% ≥97% (HPLC) ≥97% (R)-(S)-JOSIPHOS ≥97% (S)-MorfPhos ≥97% [cataCXium® FBn] ≥97%(S)-PipPhos ≥97%HPLC，≥99% ee ≥97.0%(GC)(T) ≥97.0%(RT) ≥98% Electrolyte solvent ANL-1NM2 ≥98% Electrolyte solvent ANL-1S1M3 ≥98% Electrolyte solvent ANL-2SM3 ≥98% [cataCXium® PIntB] ≥98%(R,R)-Me-BPE-Rh ≥98%(R,R)-Ph-BPE-Rh ≥98%(R,R)-i-Pr-DUPHOS-Rh ≥98%(S,S)-Me-BPE-Rh ≥98%(S,S)-Ph-BPE-Rh ≥98%(mixture of endo and exo isomers) ≥98%(~2:1 mixture of diaste(REO)mers) ≥98%, 25-0200, contained in 50 ml Swagelok® cylinder96-1070 for CVD/ALD ≥98%, 25-0210, contained in 50 ml Swagelok® cylinder 96-1070 for CVD/ALD ≥98%, 73-0700, contained in 50 ml Swagelok® cylinder（96-1070） for CVD/ALD ≥98%, powder, −325 mesh ≥98%,99.9+%-In ≥98%,ACS ≥98%~2:1 mixture of diaste(REO)mers ≥98.0%(HPLC) ≥99% trace metals basis ≥99%, 31-2000, contained in 50 ml Swagelok® cylinder96-1070 for CVD/ALD ≥99.5%, suitable for plant cell culture ≥99.5%,无水级,水分≤0.005% ≥99.5%,粒径;0.5-1.5mm ≥99.9% metals basis,Pt ≥46.0% ≥99.9% metals basis，Ir 56.0% min ≥99.9%(GC) ≥99.9%，超纯级 ≥99.99% metals basis,≥200目 ≥99.995% metals basis ≥99.999% metals basis,D50 ≥80目 ≥99.999% metals basis，粒径：1-6mm ≥99.999%(metals basis) 亲水,羟值25±3 亲水,羟值87±10 亲油，羟值150±10 仅供熔点温度计校准用 仅供罗丹明 B 检测用 低苯级,≥99.9%(GC) 低钠级,99.95% metals basis 供 GC 法检查时作对照用 供 GC 法测定用 供 HPLC 及 UV 法测定用 供 HPLC 含量测定用。 供 HPLC 含量测定用化学对照 品 供 HPLC 外标法检查和 UV 法含 量测定用 供 HPLC 法及 UV 法测定 供 HPLC 法和 GC 法检查用 供 HPLC 法有关物质检查 供 HPLC 法杂质检查 供 HPLC 法鉴别与含量测定使 用 供 HPLC 法鉴别和含量测定用 供 HPLC 法鉴别用 供 IR 法鉴别和含量测定用 供 IR 鉴别、HPLC 鉴别和含量 测定用 供 IR 鉴别、含量测定用 供 TLC 杂质检查对照品使用 供 TLC 检查用 供 TLC 法含量测定、鉴别用 供 TLC 法鉴别用 供 UV 含量测定用 供 UV 法含量测定用,供 HPLC 法检查用 供乌梅(炙乌梅)补充检验方 法用 供分光度法含量测定时作对 照用 供分子量与分子量分布系统 适用性试验用 供单唾液酸四己糖神经节苷 脂钠及其注射剂鉴别及含量 测定用 供原子吸收法溶出度测定用 供含量测定及 UV 法测定用 供含量测定；供 HPLC 法测定 供 UV 法测定 供实验室检测用 供有关物质检查 供核磁共振波谱法含量测定 用标准物质用 供检查用,供 GC 法系统适用 性试验用 供比色法含量测定用 供比色法测定用 供溶剂残留检查使用 供熔点测定用 供系统适用性用 供系统适用性试验用和 IR 鉴 别用 供红外鉴别和含量测定用 供红外鉴别用 供红外鉴别用含量测定用 供鉴别、检查和含量测定时作 对照用 供鉴别、检查用 供鉴别及含量测定用 供鉴别鉴定用。 供降压物质检查用 供限量检查用 光玻级,99.99% metals basis 光谱级, ≥99.5% 共含量测定用 内标物 农残级,99.9% 农残级，96%，SuperTrace 农残级，bp 40-60°C,SuperTrace 农残级，无稳定剂 冶金级,99.95% metals basis 分子生物学级,≥98.0%(AT) 分子生物学级,≥99.5%(AT) 分子生物学级，≥99 % 分析标准品,99.93% 分析标准品,浓度:1.4 - 1.6mg/L 分析标准品,络合量：12.280mmol/g 厚度 ~1mm, 99.95% metals basis 吡啶 ~30 %, 氢氟酸 ~70 % 含氯量;45%,含抑制剂 含氯量：42% 含氯量：50%，含抑制剂及热稳定剂 含氯量：52% 含氯量：58% 含量测定用 块状, 99.999% metals basis,1-5mm 基质:SiO2,表面基团:-C18,粒径:0.1-1μm,单位:5mg/ml 基质:SiO2,表面基团:-C18,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-C18,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-C18,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-C18,粒径:4-5μm,单位:10mg/ml 基质:SiO2,表面基团:-COOH,粒径:0.1-1μm,单位:5mg/ml 基质:SiO2,表面基团:-COOH,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-COOH,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-COOH,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-COOH,粒径:4-5μm,单位:10mg/ml 基质:SiO2,表面基团:-Epoxy,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-Epoxy,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-Epoxy,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-Epoxy,粒径:4-5μm,单位:10mg/ml 基质:SiO2,表面基团:-SH,粒径:0.1-1μm,单位:5mg/ml 基质:SiO2,表面基团:-SH,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-SH,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-SH,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-SH,粒径:4-5μm,单位:10mg/ml 基质:SiO2,表面基团:-SO3H,粒径:0.1-1μm,单位:5mg/ml 基质:SiO2,表面基团:-SO3H,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-SO3H,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-SO3H,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-SO3H,粒径:4-5μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:0.1-1μm,单位:5mg/ml 基质:SiO2,表面基团:-SiOH,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:4-5μm,单位:10mg/ml 多肽合成专用 实验用 容量法,0.1000mol/L(0.1N) 工业级，99.5% 异构体混合物，P~14%（干基计） 指示剂级 指示剂（SS） 擦拭用 效价测定 方铅矿（Galena）,天然,0.06-0.19inch 无定型，99%，粒径（D50）≤20μm 无定形，<5μm, ≥94% 无水, 99.99% metals basis 无水, 粉末, 99.9% 无水, 粉末, 99.99% 无水, 粉末, ≥99.95% metals basis 无水,-10目,99.99% trace metals basis 无水,99.5% metals basis 无水,99.999% metals basis 无水,≥99% 无水,珠状,-10目,99.99% metals basis 无水,粉末,99.9% 无水,颗粒,99.9% metals basis 无水,鳞片, 99.99% metals basis 无水、粉末,99.99% metals basis 无水溶剂级 无水级, 95% 无水级, 98% 无水级, 99.8%,H2O ≤0.003% 无水级, 99.8%,H2O≤0.001% 无水级, 99.8% 无水级, 99.9% metals basis 无水级, ≥99% 无水级, 水分≤0.3%,含变性剂 无水级,98% 无水级,99.8%,H2O≤100ppm 无水级,99.9% metals basis,粉末 无水级,99.995% metals basis 无水级,AR,≥99.0% (AT) 无水级,≥98.5% (titration) 无水级,≥99.9%, 无稳定剂 无水级,水分≤0.003%,含变性剂 无水级，99.995% metals basis 无水，99.9% metals basis 无水，99.99% metal basis 无水，99.995% metals basis 昆虫细胞培养级, ≥99% 有关物质检查 有关物质检查用 检测 棒状,99.9999% metals basis 植物细胞培养级, ≥98% 植物细胞培养级,Fe 21-23 % 比表面积3-8m2/g, 粒度60-200nm,99.9% 氮≥19.5 % 水溶性，80%有效组分 水溶液（苯胺黄）0.1%（w/v） 油溶性，97%有效组分 活性物含量50% 浓度范围:11.2µg/L 浓度范围:3.7µg/L 浓度范围:5.00-6.56ug/L 液体，模数 3.1-3.4 溴甲酚绿 0.1% w/ v in EtOH 95% -甲基红0.2% w/ v in EtOH 95% 3:1 溶于三乙醇胺，硬水指示剂 照相一级 片状, 99.999% metals basis 球形,D50:>30μm,≥99.8% 球形,D50:11-13μm,≥99.8% 球形,D50:13-15μm,≥99.8% 球形,D50:15-17μm,≥99.8% 球形,D50:17-19μm,≥99.8% 球形,D50:19-21μm,≥99.8% 球形,D50:2-3μm,≥99.8% 球形,D50:20-25μm,≥99.8% 球形,D50:25-30μm,≥99.8% 球形,D50:3-4μm,≥99.8% 球形,D50:4-5μm,≥99.8% 球形,D50:5-6μm,≥99.8% 球形,D50:6-7μm,≥99.8% 球形,D50:7-8μm,≥99.8% 球形,D50:8-9μm,≥99.8% 球形,D50:9-11μm,≥99.8% 生物技术级 用于GC衍生化, ≥99.8% (GC) 用于GC衍生化 用于GC衍生化，10% TMCS 用于GC顶空测试,≥99.9% 用于GC顶空测试 用于GC顶空测试，≥99.9% 用于HPLC衍生化,≥99.0% (HPLC) 用于光谱测定胺,≥99.5%(HPLC) 用于分子生物学,≥99.5%(AT) 用于挥发性有机物的GC/MS分析， ≥99.9％ 用于昆虫细胞培养，用于植物细胞培养, ≥96.0% 用于植物细胞培养,99% 用于植物细胞培养,99.5% 用于滴定法测定异氰酸酯,≥99.5%(GC) 用于细胞、昆虫细胞植物细胞培养,≥99.0% 用于细胞和昆虫细胞培养, 81-83% as MoO3 用于细胞和植物细胞培养，99% 用于细胞培养,99% 用于细胞培养、昆虫细胞培养,98% 电子级,0.8～1.0um,99.5% 电子级,99.98% metals basis 电池级，99.9% metals basis 电镀级,99% 电镀级 稀释成1升使用，稀释后的浓度为0.01M 粉末, <4 μm, 99.5% metals basis 粉末, 1-2 μm, 99% metals basis 粉末, ≥99.9% metals basis 粉末,98%,Zr <1.5% 粉末,99.5% metals basis 粉末,99.9% metals basis 粉末 粉末，99.9% metals basis, <10μm 粉末，99.9% metals basis 粒径<100 nm，5 wt. % 水溶液, ≥99.9% metals basis 粒径1μm-1.2μm 粒径：100-500nm，BET比表面1000-1600 m2/g 粒径：≤20nm 系统适用性用 系非药典用 纯度标准物质99.96%+-0.02% 纯度：99.5% 平均粒径：100nm 纯度：99.5% 平均粒径：30nm 细胞培养级, ≥98% 细胞培养级 细胞培养级，98-101% 细胞培养级，99% 色谱级,≥99.9% 药典级（Ph. Eur., BP, USP, 99-100.5%） 药用级,99.5% 药用级,≥325目 规格或纯度中文页面123 规格或纯度中文页面12 规格或纯度中文页面1 试剂级, 96.0% 试剂级,Ir>52% 试剂级 超干, 99%metals basis 超干, 99.999% (metals basis) 超干, 99.999% metals basis 超干,99.999% metals basis 超干级 , 99.99% (metals basis) 超干级, 99.9% 超干级, 99.9+% (REO) 超干级, 99.95% (REO) 超干级, 99.95% (metals basis excluding Zr), Zr <0.5% 超干级, 99.98% (REO) 超干级,99.9% (metals basis), Zr<0.5% 超干级,99.9% metals basis 超干级,H2O≤0.004% ,含50-150ppm异戊烯稳定剂 超纯级，≥99.9% 轻质、密度：0.84-0.86 醇溶液0.02% 醇溶液0.1%（w/v） 重质、密度：0.86-0.89 鉴供有关物质检查用 鉴别及含量测定用 鉴别及系统适用性用 鉴别和含量测定 钯含量（干基10%） 铂含量（干基10%） 铱含量（干基10%） 铱含量：43.0% 银含量：77.0 % 锭, 存放于油中,99.9% metals basis 锭,1-10mm， 保存在油里, 99.5% metals basis 镀膜级，颗粒，99.9% metals basis 限度检查 高钠级，98.5% ＞98.5% metals basis,5μm,球形 ＞98.5% metals basis,85μm,球形 ＞99% ＞99.5% metals basis,5-25nm,球形 ＞99.7% metals basis,20μm,球形 ＞99.7% metals basis,8μm,球形 ＞99.8% metals basis,300nm-400nm,球形 ＞99.9% metals basis,35μm,球形 ＞99.99% metals basis,1-5mm

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